Title:
METHOD OF PHOTOLITHOGRAPHY USING A FLUID AND A SYSTEM THEREOF
Document Type and Number:
WIPO Patent Application WO2005074606
Kind Code:
A3
Abstract:
A photolithographic exposure system for use on a photoresis on a substrate includes an illumination system, a photomask with one or more object patterns, a projection optical exposure system, and a fluid dispensing system. The projection optical exposure system is positioned to project an image of the one or more object patterns toward an image plane. The fluid dispensing system positions a fluid between the projection optical exposure system and the photoresist on the substrate. The fluid has a refractive index value above a refractive index value of water and an absorbance below 0.8 per millimeter at wavelength between about 180 nm and about 300 nm.
Inventors:
SMITH BRUCE W (US)
Application Number:
PCT/US2005/003219
Publication Date:
October 05, 2006
Filing Date:
February 03, 2005
Export Citation:
Assignee:
ROCHESTER INST TECH (US)
International Classes:
G03B11/00; G03B27/42; G03F7/20; G03F9/00
Foreign References:
| US5900354A | 1999-05-04 | |||
| US4493533A | 1985-01-15 |
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