Title:
METHOD FOR POLISHING GLASS SUBSTRATE, POLISHING LIQUID, METHOD FOR MANUFACTURING GLASS SUBSTRATE, METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC DISC, AND METHOD FOR MANUFACTURING MAGNETIC DISC
Document Type and Number:
WIPO Patent Application WO/2016/186214
Kind Code:
A1
Abstract:
The present invention provides a method for manufacturing a glass substrate, in which polishing speed can be improved in a polishing process of using cerium oxide as polishing abrasive grains to polish the surface of a glass substrate. The method for polishing a glass substrate according to the present invention comprises polishing the surface of the glass substrate by supplying a polishing liquid containing cerium oxide as polishing abrasive grains to a polishing surface of the glass substrate. An alkaline liquid that contains the cerium oxide as polishing abrasive grains and also contains an inorganic reducing agent is used as the polishing liquid.
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Inventors:
NAKAGAWA HIROKI (JP)
Application Number:
PCT/JP2016/065103
Publication Date:
November 24, 2016
Filing Date:
May 20, 2016
Export Citation:
Assignee:
HOYA CORP (JP)
International Classes:
G11B5/84; B24B37/00; C09G1/02; C09K3/14; G11B5/73
Domestic Patent References:
| WO2014122982A1 | 2014-08-14 |
Foreign References:
| JPH09137155A | 1997-05-27 | |||
| JP2013055366A | 2013-03-21 | |||
| JP2015008212A | 2015-01-15 | |||
| JP2015066656A | 2015-04-13 |
Attorney, Agent or Firm:
OTSUKA TAKEFUMI (JP)
大塚 武史 (JP)
大塚 武史 (JP)
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