Title:
METHOD FOR POLISHING WORK
Document Type and Number:
WIPO Patent Application WO/2001/096065
Kind Code:
A1
Abstract:
A method for polishing the surface of a disc-like work by sliding the surface of the work on an abrasive cloth while holding the back of the work with a work holding plate, characterized in that a back face coating film (6) having a thickness at the peripheral part smaller than that of the central part of the work (W) or so formed that the peripheral part of the back face of the work is exposed is formed on the back face of the work, and the surface of the work is polished while holding the back face of the work with a work holding plate (1) through the back face coating film. By the method, the edge rounding is suppressed when such a disc-like work required to have a very precise flatness, such as a semiconductor wafer is polished.
Inventors:
Masumura, Hisashi c/o Shirakawa R & D Center (Shin-Etsu Handotai Co. Ltd. 150, Aza Ohira,
Oaza Odakur, Nishigo-mura Nishishirakawa-gun Fukushima, 961-8061, JP)
Ikeda, Shunichi c/o Shirakawa R & D Center (Shin-Etsu Handotai Co. Ltd. 150, Aza Ohira, Oaza Odakur, Nishigo-mura Nishishirakawa-gun Fukushima, 961-8061, JP)
Kitagawa, Koji c/o Shirakawa R & D Center (Shin-Etsu Handotai Co. Ltd. 150, Aza Ohira, Oaza Odakur, Nishigo-mura Nishishirakawa-gun Fukushima, 961-8061, JP)
Ikeda, Shunichi c/o Shirakawa R & D Center (Shin-Etsu Handotai Co. Ltd. 150, Aza Ohira, Oaza Odakur, Nishigo-mura Nishishirakawa-gun Fukushima, 961-8061, JP)
Kitagawa, Koji c/o Shirakawa R & D Center (Shin-Etsu Handotai Co. Ltd. 150, Aza Ohira, Oaza Odakur, Nishigo-mura Nishishirakawa-gun Fukushima, 961-8061, JP)
Application Number:
PCT/JP2001/004838
Publication Date:
December 20, 2001
Filing Date:
June 08, 2001
Export Citation:
Assignee:
SHIN-ETSU HANDOTAI CO., LTD. (4-2 Marunouchi 1-chome Chiyoda-ku, Tokyo, Tokyo, 100-0005, JP)
Masumura, Hisashi c/o Shirakawa R & D Center (Shin-Etsu Handotai Co. Ltd. 150, Aza Ohira, Oaza Odakur, Nishigo-mura Nishishirakawa-gun Fukushima, 961-8061, JP)
Ikeda, Shunichi c/o Shirakawa R & D Center (Shin-Etsu Handotai Co. Ltd. 150, Aza Ohira, Oaza Odakur, Nishigo-mura Nishishirakawa-gun Fukushima, 961-8061, JP)
Kitagawa, Koji c/o Shirakawa R & D Center (Shin-Etsu Handotai Co. Ltd. 150, Aza Ohira, Oaza Odakur, Nishigo-mura Nishishirakawa-gun Fukushima, 961-8061, JP)
Masumura, Hisashi c/o Shirakawa R & D Center (Shin-Etsu Handotai Co. Ltd. 150, Aza Ohira, Oaza Odakur, Nishigo-mura Nishishirakawa-gun Fukushima, 961-8061, JP)
Ikeda, Shunichi c/o Shirakawa R & D Center (Shin-Etsu Handotai Co. Ltd. 150, Aza Ohira, Oaza Odakur, Nishigo-mura Nishishirakawa-gun Fukushima, 961-8061, JP)
Kitagawa, Koji c/o Shirakawa R & D Center (Shin-Etsu Handotai Co. Ltd. 150, Aza Ohira, Oaza Odakur, Nishigo-mura Nishishirakawa-gun Fukushima, 961-8061, JP)
International Classes:
B24B37/04; B24B41/06; (IPC1-7): B24B37/04; H01L21/304
Attorney, Agent or Firm:
Yoshimiya, Mikio (Uenosansei Bldg. 4F 6-4, Motoasakusa 2-chome Taito-ku, Tokyo, 111-0041, JP)
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