METHOD FOR POTATO SPROUT CONTROL

WIPO Patent Application WO/2011/129402

A1

A method for potato sprout control, comprising: (A) after storing potatoes for 3-12 months at a temperature of 2-15°C in an atmosphere with an ethylene concentration of 1-100 ppm, washing the potatoes with water to remove the soil and dirt therefrom, draining the potatoes and, if necessary, drying the same; (B) putting the potatoes in a distribution container, which is a polyolefin bag with small pores, together with an ethylene-generating pack showing an ethylene generation rate of 0.5-5 mL/(g·day) at 20°C in a 100% RH atmosphere, followed by air-tightly sealing the container; and (C) maintaining the ethylene concentration in the distribution container, which contains the potatoes in the air-tightly sealed state, at 1-100 ppm for 1-20 days at a temperature of 2-30°C. According to this method, potato sprout can be effectively controlled during the process of distribution and supply to consumers, after harvesting and storage.

OSHIDA Yutaka (6-1, Kanda-Surugadai 3-chome, Chiyoda-k, Tokyo 22, 〒1010122, JP)
押田　豊 (〒22 東京都千代田区神田駿河台３丁目６番１号　エージレスサービスセンター株式会社内 Tokyo, 〒1010122, JP)
TAKEUCHI Teruo (6-1, Kanda-Surugadai 3-chome, Chiyoda-k, Tokyo 22, 〒1010122, JP)

JP2011/059285

October 20, 2011

April 14, 2011

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MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2 Marunouchi 2-chome, Chiyoda-ku Tokyo, 24, 〒1008324, JP)
三菱瓦斯化学株式会社 (〒24 東京都千代田区丸の内二丁目５番２号 Tokyo, 〒1008324, JP)
OSHIDA Yutaka (6-1, Kanda-Surugadai 3-chome, Chiyoda-k, Tokyo 22, 〒1010122, JP)
押田　豊 (〒22 東京都千代田区神田駿河台３丁目６番１号　エージレスサービスセンター株式会社内 Tokyo, 〒1010122, JP)

A23B7/144; B65D81/26

KATSUNUMA Hirohito et al. (Kyowa Patent & Law Office, Room 323 Fuji Bldg., 2-3, Marunouchi 3-chome, Chiyoda-k, Tokyo 05, 〒1000005, JP)

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