Title:
METHOD FOR PREPARING CHROMIUM-SILICON ALLOY SPUTTERING TARGET MATERIAL
Document Type and Number:
WIPO Patent Application WO/2022/095336
Kind Code:
A1
Abstract:
Provided is a method for preparing a chromium-silicon alloy sputtering target material. The preparation method comprises the following steps: (1) mixing a chromium powder and a silicon powder under non-oxidizing atmosphere conditions to obtain a mixed powder; (2) filling a mold with same, and then subjecting the mixed powder filled in the mold to vacuum hot-pressing sintering; and (3) after the vacuum hot-pressing sintering is finished, furnace cooling same to obtain the chromium-silicon alloy sputtering target material.
Inventors:
YAO LIJUN (CN)
BIAN YIJUN (CN)
PAN JIE (CN)
WANG XUEZE (CN)
YANG HUIZHEN (CN)
BIAN YIJUN (CN)
PAN JIE (CN)
WANG XUEZE (CN)
YANG HUIZHEN (CN)
Application Number:
PCT/CN2021/086058
Publication Date:
May 12, 2022
Filing Date:
April 09, 2021
Export Citation:
Assignee:
KONFOONG MATERIALS INT CO LTD (CN)
International Classes:
C22C1/05; C23C14/34; C22C27/06
Domestic Patent References:
| WO2020105591A1 | 2020-05-28 |
Foreign References:
| CN112376023A | 2021-02-19 | |||
| CN102978576A | 2013-03-20 | |||
| CN102677005A | 2012-09-19 | |||
| CN111058004A | 2020-04-24 | |||
| CN105483624A | 2016-04-13 |
Attorney, Agent or Firm:
BEYOND ATTORNEYS AT LAW (CN)
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