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Title:
METHOD OF PREPARING HIGH-DENSITY DIAMOND THIN FILM
Document Type and Number:
WIPO Patent Application WO/2018/176217
Kind Code:
A1
Abstract:
A method of preparing a high-density diamond thin film, comprising the following steps: (1) performing a surface-charging process on a surface of a cemented carbide substrate, wherein the surface-charging process comprises a positive or negative charging process; (2) preparing a diamond suspension: adding an organic acid or an amine-containing compound to water to obtain a pretreatment liquid; adding diamond powder to the pretreatment liquid and uniformly dispersing to obtain a nano-diamond suspension; wherein the organic acid comprises one or more of oxalic acid and citric acid, and the amine-containing compound is selected from glutamic acid and aspartic acid, and one or more aliphatic amines having 2 to 5 carbon atoms; (3) placing the surface-charged substrate in the nano-diamond suspension and performing ultrasonic vibration such that the nano-diamond adsorbs on the surface of the substrate, wherein the charge of the nano-diamond suspension is opposite to the charge of the substrate; (4) using a chemical vapor deposition apparatus, growing a diamond thin film on the substrate obtained in step (3).

Inventors:
TANG YONGBING (CN)
WANG TAO (CN)
ZHANG WENJUN (CN)
Application Number:
PCT/CN2017/078429
Publication Date:
October 04, 2018
Filing Date:
March 28, 2017
Export Citation:
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Assignee:
SHENZHEN INST ADV TECH (CN)
International Classes:
C23C16/27; C23C16/46
Foreign References:
CN105483644A2016-04-13
CN104947068A2015-09-30
CN105483643A2016-04-13
CN1470678A2004-01-28
EP0753481A11997-01-15
Attorney, Agent or Firm:
SCIHEAD IP LAW FIRM (CN)
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