METHOD FOR PREPARING HIGH PURITY COPPER OXIDE CONTAINING A TRACE AMOUNT OF CHLORINE FROM WASTE LIQUID CONTAINING CU(NH3)4CL2

WIPO Patent Application WO/2010/050668

A3

The present invention relates to a method for preparing a high purity copper oxide from waste liquid containing Cu(NH3)4Cl2. The method for preparing high purity copper oxide containing a trace amount of chlorine from waste liquid containing Cu(NH3)4Cl2 comprises the steps of: a) filtering off impurities from the waste liquid containing Cu(NH3)4Cl2 by using a micro-filter; b) mixing materials made from chemicals that may generate a large amount of air bubbles and a sodium hydroxide solution, heating the mixture solution so that the temperature of the mixture solution is kept at a predetermined level until the reaction finishes, adding the waste liquid containing Cu(NH3)4Cl2 to the mixture solution, and aging the resultant mixture solution added with the waste liquid over a predetermined period of time; and c) filtering, washing, and dehydrating the product obtained in said step b), and heating and drying the product while being supplied with air. The method for preparing copper oxide according to the present invention generates porous copper oxide having a wide specific surface area to enable the easy removal of a chlorine compound, and thus prepares high quality copper oxide which has a chlorine content of 5ppm or less, a purity of 99.5% or higher, and a superior acid solubility.

PARK SUNG-JONG (KR)

PCT/KR2009/004710

June 24, 2010

August 24, 2009

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PARK SUNG-JONG (KR)

C01G3/04

KR100840553B1	2008-06-23
KR100562048B1	2006-03-22
KR0122510B1	1997-11-11
EP0393270A1	1990-10-24

LEE, Jeong-Hyun (541-3Gozan-dong, Danwoen-g, Ansan-si Gyeonggi-do 425-868, KR)

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