Title:
METHOD FOR PREPARING TFT ARRAY SUBSTRATE, TFT ARRAY SUBSTRATE, AND DISPLAY PANEL
Document Type and Number:
WIPO Patent Application WO/2019/196191
Kind Code:
A1
Abstract:
A method for preparing a TFT array substrate, comprising: forming a gate and gate scan lines on a hard substrate; continuing to sequentially deposit a gate insulating layer, an active layer and a second metal layer; forming a first photoresist layer and a second photoresist layer on the second metal layer, the first photoresist layer comprising a first-order photoresist layer, a second-order photoresist layer and a third-order photoresist layer with increasing thickness, the first-order photoresist layer being provided at the middle of the first photoresist layer and forming a channel; performing ashing treatment to remove the first-order photoresist layer, and performing etching to form a source electrode and a drain electrode; performing ashing treatment to remove the second-order photoresist layer, and then depositing a passivation protective layer; and peeling off the third-order photoresist layer and the second photoresist layer, and depositing a pixel electrode and a common electrode.
Inventors:
LUO CHUANBAO (CN)
YAO JIANGBO (CN)
YAO JIANGBO (CN)
Application Number:
PCT/CN2018/090650
Publication Date:
October 17, 2019
Filing Date:
June 11, 2018
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
H01L21/84; H01L27/12
Foreign References:
| US20030232456A1 | 2003-12-18 | |||
| CN101325181A | 2008-12-17 | |||
| CN101097928A | 2008-01-02 |
Attorney, Agent or Firm:
SCIHEAD IP LAW FIRM (CN)
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