Title:
METHOD OF PREPARING TRIBOELECTRIC FILM WITH INTAGLIATED, EMBOSSED OR DUAL EMBOSSED PATTERN, TRIBOELECTRIC FILM PREPARED THEREBY, AND HIGH-PERFORMANCE TRIBOELECTRIC NANOGENERATOR COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2017/078301
Kind Code:
A1
Abstract:
The present invention relates to a method for preparing a triboelectric film having an intagliated, embossed or dual embossed pattern on the basis of a colloid single-layer film formed by forced assembly on a substrate, a triboelectric film prepared thereby, and a high-performance triboelectric nanogenerator comprising the same. When applying a triboelectric film having an intagliated, embossed or dual embossed pattern prepared by the preparation method of the present invention to a triboelectric nanogenerator, it is possible to achieve not only excellent electrical performances, but also moisture resistance and high mechanical stability in a large scale.
Inventors:
CHO JINHAN (KR)
JANG DONG-JIN (KR)
JANG DONG-JIN (KR)
Application Number:
PCT/KR2016/011790
Publication Date:
May 11, 2017
Filing Date:
October 20, 2016
Export Citation:
Assignee:
UNIV KOREA RES & BUS FOUND (KR)
International Classes:
H02N1/04; B01J2/30; B32B3/30; B32B27/00; C08G77/04; C08J3/24
Foreign References:
| KR20150108453A | 2015-09-30 | |||
| KR20150111774A | 2015-10-06 | |||
| JP2001124810A | 2001-05-11 | |||
| US20110171430A1 | 2011-07-14 | |||
| CN104660095A | 2015-05-27 |
Attorney, Agent or Firm:
JUNG, Eun Youl (KR)
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