Title:
METHOD FOR PREVENTING A PHOTOCATALYST FROM DECREASING IN HYDROPHILICITY
Document Type and Number:
WIPO Patent Application WO/2012/011560
Kind Code:
A1
Abstract:
Disclosed is a method for preventing a photocatalyst from decreasing in hydrophilicity due to contamination by components seeping from a sealing material for anchoring a construction material, exterior material, glass structure, or other article on which a photocatalyst layer is formed. In said method, a transparent sealing-material-component seepage-prevention layer, which contains a modified epoxy resin comprising polymerizable unsaturated monomers graft-polymerized onto or copolymerized with an epoxy resin, is formed on the surface of the sealing material. Said polymerizable unsaturated monomers include a carboxyl-group-containing monomer, and a modified epoxy resin obtained by a carboxyl-group/epoxy-group reaction after graft polymerization or copolymerization is more favorable.
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Inventors:
KATAOKA KENJI (JP)
Application Number:
PCT/JP2011/066687
Publication Date:
January 26, 2012
Filing Date:
July 22, 2011
Export Citation:
Assignee:
ISHIHARA SANGYO KAISHA (JP)
KATAOKA KENJI (JP)
KATAOKA KENJI (JP)
International Classes:
E04F13/08; B01J33/00; B01J35/02; E04B1/682; E06B3/56
Foreign References:
| JP2004300863A | 2004-10-28 | |||
| JP2003268350A | 2003-09-25 | |||
| JP2007039548A | 2007-02-15 | |||
| JP2004156023A | 2004-06-03 | |||
| JP2001064683A | 2001-03-13 | |||
| JP2001064625A | 2001-03-13 | |||
| JP2004300863A | 2004-10-28 |
Other References:
See also references of EP 2597223A4
Attorney, Agent or Firm:
ASAMURA Kiyoshi et al. (JP)
Hiroshi Asamura (JP)
Hiroshi Asamura (JP)
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Claims: