METHOD OF PROCESSING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

Title:

METHOD OF PROCESSING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

Document Type and Number:

WIPO Patent Application WO/2005/015625

Kind Code:

A1

Abstract:

Substrate processing apparatus (10) comprising vapor generation unit (37₁) capable of bubbling an organic solvent with an inert gas to thereby generate a mixed gas of organic solvent vapor and inert gas; support means for supporting multiple substrates to be processed at equal pitches and in parallel and vertical posture; processing vessel (15) in which a collection of substrates supported by the above support means is accommodated; lid (30) for covering an upper opening of the processing vessel (15); jet nozzles (33) fitted to the lid (30); and first piping (37₁₂), (34₂), (34₂₁), (34₂₂) communicating the vapor generation unit (37₁) and the jet nozzles (33) with each other, wherein the first piping and the jet nozzles are equipped with respective heaters, these heaters controlled so that the dry gas injected through the jet nozzles contains organic solvent mists of submicron size.

Inventors:

NAKATSUKASA KATSUYOSHI (JP)
OGASAWARA KAZUHISA (JP)
SAKAIHARA YOSHIAKI (JP)
HARUKI YOSHIHIRO (JP)
KAWATE MUNENORI (JP)

Application Number:

PCT/JP2003/015431

Publication Date:

February 17, 2005

Filing Date:

December 02, 2003

Export Citation:

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Assignee:

SES CO LTD (JP)
NAKATSUKASA KATSUYOSHI (JP)
OGASAWARA KAZUHISA (JP)
SAKAIHARA YOSHIAKI (JP)
HARUKI YOSHIHIRO (JP)
KAWATE MUNENORI (JP)

International Classes:

F26B9/06; B08B3/04; H01L21/00; H01L21/304; H01L21/306; (IPC1-7): H01L21/304

Foreign References:

JP2000055543A	2000-02-25
JP2002134461A	2002-05-10
JPH10118586A	1998-05-12
JPH11191549A	1999-07-13
JP2002359221A	2002-12-13
JPH11191549A	1999-07-13
EP0782889A2	1997-07-09
US5896875A	1999-04-27
US6219936B1	2001-04-24

Other References: