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Title:
METHOD FOR PRODUCING ACID GAS SEPARATION COMPLEX, ACID GAS SEPARATION COMPLEX, AND ACID GAS SEPARATION MODULE
Document Type and Number:
WIPO Patent Application WO/2014/050226
Kind Code:
A1
Abstract:
This method for producing an acid gas separation complex comprises: an extraction step, a coating solution preparation step, a coating step, and a drying step. The extraction step involves bringing a liquid, which includes at least one type of compound selected from a group comprising a functional compound having at least one function selected from a group comprising ion-exchange capacity and chelating ability, and an alkali metal ion adsorbent into contact with an acid gas separation complex obtained by forming an acid gas separation layer, which includes a water-absorbing polymer and at least one type of acid gas carrier selected from a group comprising alkali salt metals, on a porous substrate so as to obtain an extract of the acid gas carrier. The coating solution preparation step involves mixing at least the extract of the acid gas carrier and the water-absorbing polymer together to prepare an acid gas separation layer-forming coating solution. The coating step involves applying the acid gas separation layer-forming coating solution on the porous substrate to form a coating film. The drying step involves drying the coating film to form an acid gas separation layer.

Inventors:
ISHIZUKA KENICHI (JP)
HOSOYA YOICHI (JP)
Application Number:
PCT/JP2013/066404
Publication Date:
April 03, 2014
Filing Date:
June 13, 2013
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
B01D69/00; B01D53/22; B01D67/00; B01D69/12; B01D71/02
Domestic Patent References:
WO2012096055A12012-07-19
Foreign References:
JPH08243364A1996-09-24
JPH05504298A1993-07-08
JP2009195900A2009-09-03
JPH07109376A1995-04-25
JP2013027806A2013-02-07
Attorney, Agent or Firm:
NAKAJIMA, Jun et al. (JP)
Nakajima 淳 (JP)
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