Title:
METHOD FOR PRODUCING ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/203254
Kind Code:
A1
Abstract:
The present invention addresses the first problem of providing a method for producing an active light ray-sensitive or radiation-sensitive resin composition, by which a pattern having excellent LWR can be formed even in cases where the resin composition is prepared using a procedure comprising preparing in advance a polymer solution containing an acid-dissociable resin and a solvent, storing the polymer solution for a prescribed period of time, and then mixing the polymer solution with other raw materials such as a photo-acid generator. In addition, the present invention addresses the second problem of providing: a method for forming a pattern by using an active light ray-sensitive or radiation-sensitive resin composition obtained using the production method; and a method for producing an electronic device. This method for producing an active light ray-sensitive or radiation-sensitive resin composition includes a step A for preparing a polymer solution that contains a solvent and a resin whose polarity increases upon decomposition through the action of an acid; a step B for producing a solution-accommodating body which includes an accommodating container and the polymer solution housed in the accommodating container, and in which the content of an inert gas is 85 vol% or more of the space inside the accommodating container that is not filled with the polymer solution, and for storing the polymer solution in the solution-accommodating body; and a step C for mixing the polymer solution stored in the solution-accommodating body with a compound that generates an acid upon irradiation with active light rays or radiation. The resin whose polarity increases upon decomposition through the action of an acid is a resin that includes a prescribed structure.
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Inventors:
MARUMO KAZUHIRO (JP)
Application Number:
PCT/JP2020/011703
Publication Date:
October 08, 2020
Filing Date:
March 17, 2020
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C08F220/28; G03F7/038; G03F7/039; G03F7/20
Foreign References:
| JP2013007846A | 2013-01-10 | |||
| JP2015143363A | 2015-08-06 | |||
| JP2014118466A | 2014-06-30 | |||
| JP2008050483A | 2008-03-06 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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