METHOD FOR PRODUCING ANTI-REFLECTION FILM, AND ANTI-REFLECTION FILM

WIPO Patent Application WO/2017/022566

A1

The present invention provides a method for producing an anti-reflection film, which sequentially comprises, in the following order: a step (1) for forming a layer (a) by applying a composition containing a curable compound (a1), particles (a2) and a solvent onto a base and by having the solvent volatilize, said layer (a) having a thickness in which the particles (a2) are buried; a step (2) for curing some of the compound (a1); a step (3) for forming a recessed and projected shape by having some of the compound (a1) penetrate into the base or volatilize; and a step (4) for curing the compound (a1). The present invention also provides an anti-reflection film which comprises a base and an anti-reflection layer containing particles and a resin, and wherein: the average surface roughness Ra of the anti-reflection layer is 15 nm or more; the angle θ between the line passing through point P where the particles, the resin and the air interface intersect with each other and being perpendicular to the base and the tangent line to the curve formed by the resin and the air interface at the point P in a cross-section of the anti-reflection film in the thickness direction is 5° or more; and the difference between the integrated reflectance and the specular reflectance of the anti-reflection film is 0.6% or less.

MATSUMOTO AYAKO (JP)
WAKIZAKA DAIKI (JP)
IBUKI SHUNTARO (JP)

PCT/JP2016/071862

February 09, 2017

July 26, 2016

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FUJIFILM CORP (JP)

G02B1/118; B05D5/06; B32B3/26; B32B7/02; B32B27/20; G02B1/14

WO2014185314A1

2014-11-20

JP2012145748A	2012-08-02
JP2000256040A	2000-09-19
JP2014235259A	2014-12-15
JP2006003453A	2006-01-05

TAKAMATSU Takeshi et al. (JP)

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