Title:
METHOD FOR PRODUCING AQUEOUS POLYESTER RESIN, AQUEOUS POLYESTER RESIN, METHOD FOR PRODUCING AQUEOUS COATING COMPOSITION, AND AQUEOUS COATING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2023/136092
Kind Code:
A1
Abstract:
A method for producing an aqueous polyester resin which comprises a first step, a second step, and a third step. In the first step, a recycled polyester, a first polycarboxylic acid ingredient, which includes a residue of a divalent polycarboxylic acid that is not terephthalic acid, and a polyhydric alcohol ingredient are used to conduct an ester formation reaction and a depolymerization reaction. In the second step, a reaction product obtained in the first step and a second polycarboxylic acid ingredient, which includes a residue of a polycarboxylic acid having a functionality of three or greater, are used to conduct an ester formation reaction. In the third step, a polycondensation reaction is conducted by depressurization. In the first step, the recycled polyester is used in such an amount that the proportion of terephthalic acid residues to the sum of the terephthalic acid residues contained in the recycled polyester and the polycarboxylic-acid residues contained in the first and second polycarboxylic acid ingredients is 20-72 mass%. The aqueous polyester resin to be obtained has an acid value of 30-120 mgKOH/g.
Inventors:
SAKAKIBARA TERU
TANAGAWA KAZUHIRO
TANAGAWA KAZUHIRO
Application Number:
PCT/JP2022/047543
Publication Date:
July 20, 2023
Filing Date:
December 23, 2022
Export Citation:
Assignee:
GOO CHEMICAL CO LTD (JP)
International Classes:
C08G63/78; C08G63/127; C09D5/00; C09D167/00
Domestic Patent References:
| WO2017158643A1 | 2017-09-21 |
Foreign References:
| JP2002179783A | 2002-06-26 | |||
| JP2001505608A | 2001-04-24 | |||
| JP2011219545A | 2011-11-04 | |||
| JP2019137790A | 2019-08-22 | |||
| JP2009275187A | 2009-11-26 | |||
| JP2009275186A | 2009-11-26 | |||
| JP2004067910A | 2004-03-04 | |||
| JP2005517050A | 2005-06-09 | |||
| JP2003327679A | 2003-11-19 |
Attorney, Agent or Firm:
HOKUTO PATENT ATTORNEYS OFFICE (JP)
Download PDF:
Previous Patent: ABNORMALITY MONITORING METHOD, ABNORMALITY MONITORING SYSTEM, AND PROGRAM
Next Patent: IMAGING ELEMENT AND ELECTRONIC APPARATUS
Next Patent: IMAGING ELEMENT AND ELECTRONIC APPARATUS