Title:
METHOD FOR PRODUCING BASE FOR METAL MASKS, METHOD FOR PRODUCING METAL MASK FOR VAPOR DEPOSITION, BASE FOR METAL MASKS, AND METAL MASK FOR VAPOR DEPOSITION
Document Type and Number:
WIPO Patent Application WO/2017/014016
Kind Code:
A1
Abstract:
With respect to a rolled metal sheet having a front surface and a back surface that is on the reverse side of the front surface, at least one of the front surface and the back surface is a surface to be processed. A method for producing a base for metal masks, wherein the thickness of a rolled metal sheet is reduced to 10 μm or less by etching a surface to be processed 3 μm or more with use of an acidic etching liquid and the surface to be processed is roughened so as to obtain a processed surface for resist having a surface roughness Rz of 0.2 μm or more, thereby obtaining a metal sheet for metal masks.
Inventors:
MIKAMI NAOKO (JP)
TAMURA SUMIKA (JP)
TERADA REIJI (JP)
KURATA MASASHI (JP)
FUJITO DAISEI (JP)
NISHITSUJI KIYOAKI (JP)
NISHI TAKEHIRO (JP)
TAMURA SUMIKA (JP)
TERADA REIJI (JP)
KURATA MASASHI (JP)
FUJITO DAISEI (JP)
NISHITSUJI KIYOAKI (JP)
NISHI TAKEHIRO (JP)
Application Number:
PCT/JP2016/069350
Publication Date:
January 26, 2017
Filing Date:
June 29, 2016
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD (JP)
International Classes:
C23C14/04; H01L51/50; H05B33/10
Foreign References:
JP2008041553A | 2008-02-21 | |||
JP2011166018A | 2011-08-25 | |||
JP2003193211A | 2003-07-09 | |||
JP2005211948A | 2005-08-11 | |||
JP2007107038A | 2007-04-26 |
Attorney, Agent or Firm:
ONDA, Makoto et al. (JP)
Download PDF:
Previous Patent: ROTOR, DYNAMOELECTRIC MACHINE, ROTOR PRODUCTION METHOD, AND ROTOR PRODUCTION DEVICE
Next Patent: SHIELD CONDUCTIVE PATH
Next Patent: SHIELD CONDUCTIVE PATH