METHOD FOR PRODUCING CATIONICALLY MODIFIED SILICA, CATIONICALLY MODIFIED SILICA DISPERSION, METHOD FOR PRODUCING POLISHING COMPOSITION USING CATIONICALLY MODIFIED SILICA, AND POLISHING COMPOSITION USING CATIONICALLY MODIFIED SILICA

Title:

Document Type and Number:

WIPO Patent Application WO/2018/061656

Kind Code:

A1

Abstract:

The purpose of the present invention is to provide, in a method for producing a cationically modified silica which includes modifying a silica raw material using a silane coupling agent, a means for enabling suppression of the occurrence of gelation during and after addition of the silane coupling agent. The present invention is a method for producing a cationically modified silica, the method comprising mixing a silica raw material having a negative zeta potential with a silane coupling agent having an amino group or quaternary cation group and causing a reaction between the silica raw material and the silane coupling agent so as to obtain the cationically modified silica. The cationically modified silica satisfies relational expression (1). In relational expression (1), X is a pH value that is the isoelectric point of the cationically modified silica, and Y is the pH value of the cationically modified silica.

Inventors:

TAGUCHI SOUMA (JP)
ASHITAKA KEIJI (JP)
MIWA NAOYA (JP)

Application Number:

PCT/JP2017/031956

Publication Date:

April 05, 2018

Filing Date:

September 05, 2017

Export Citation:

Click for automatic bibliography generation Help

Assignee:

FUJIMI INC (JP)

International Classes:

C01B33/146; B24B37/00; C09G1/02; H01L21/304

Domestic Patent References:

WO2016117560A1

2016-07-28

Foreign References:

JP2010269985A	2010-12-02
JP2009274923A	2009-11-26
JP2016008157A	2016-01-18
JP2011225381A	2011-11-10
JP2008280229A	2008-11-20

Attorney, Agent or Firm:

HATTA & ASSOCIATES (JP)

Download PDF:

View/Download PDF PDF Help

Previous Patent: MANAGEMENT DEVICE, MANAGEMENT METHOD, PROGRAM

Next Patent: MANAGEMENT DEVICE, MANAGEMENT METHOD, PROGRAM