Title:
METHOD FOR PRODUCING CHLOROPRENE-BASED POLYMER COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2023/188801
Kind Code:
A1
Abstract:
Provided is a method for producing a chloroprene-based polymer composition that supports a high recovery ratio from the polymerization vessel and that makes it possible to obtain dip-molded articles having a low 100% elongation modulus and an excellent tensile strength at break. The present invention provides a method for producing a chloroprene-based polymer composition, wherein the chloroprene-based polymer composition comprises a diene-based polymer A and a chloroprene-based polymer B and the diene-based polymer A and the chloroprene-based polymer B have different weight-average molecular weights. The method for producing this chloroprene-based polymer composition comprises a polymerization step for polymerizing the chloroprene-based polymer B in the presence of the diene-based polymer A.
Inventors:
KUMAGAI YUSHI (JP)
NISHINO WATARU (JP)
ITO MISAKI (JP)
NISHINO WATARU (JP)
ITO MISAKI (JP)
Application Number:
PCT/JP2023/003349
Publication Date:
October 05, 2023
Filing Date:
February 02, 2023
Export Citation:
Assignee:
DENKA COMPANY LTD (JP)
International Classes:
C08L11/00; C08F2/44; C08F279/02
Domestic Patent References:
| WO2022130737A1 | 2022-06-23 | |||
| WO2022202556A1 | 2022-09-29 |
Foreign References:
| JP2006096980A | 2006-04-13 |
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
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