Title:
METHOD FOR PRODUCING COMPOSITION FOR RESIST PATTERN COATING WITH USE OF SOLVENT REPLACEMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2018/066517
Kind Code:
A1
Abstract:
[Problem] To provide a method for producing a coating composition for reversing a pattern by being applied onto a resist film which has been patterned by a solvent development lithography process. [Solution] A method for producing a composition to be applied onto a patterned resist film, which comprises (A) a step for obtaining a hydrolysis condensation product by hydrolyzing and condensing a hydrolyzable silane in a non-alcoholic hydrophilic solvent, and (B) a step for performing solvent replacement of the hydrolysis condensation product from the non-alcoholic hydrophilic solvent to a hydrophobic solvent. A method for producing a semiconductor device, which comprises (1) a step for forming a resist film on a substrate by applying a resist composition thereto, (2) a step for subjecting the resist film to light exposure and development, (3) a step for forming a coating film in the spaces among the pattern by applying a composition obtained by the above-described production method to a patterned resist film obtained during or after the development in step (2), and (4) a step for reversing the pattern by removing the patterned resist film by etching. The production method wherein the light exposure is performed with use of an ArF laser (wavelength: 193 nm) or EUV (wavelength: 13.5 nm). The production method wherein the development is a negative development by means of an organic solvent.
Inventors:
SHIGAKI SHUHEI (JP)
TAKEDA SATOSHI (JP)
SHIBAYAMA WATARU (JP)
NAKAJIMA MAKOTO (JP)
SAKAMOTO RIKIMARU (JP)
TAKEDA SATOSHI (JP)
SHIBAYAMA WATARU (JP)
NAKAJIMA MAKOTO (JP)
SAKAMOTO RIKIMARU (JP)
Application Number:
PCT/JP2017/035832
Publication Date:
April 12, 2018
Filing Date:
October 02, 2017
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
G03F7/40; G03F7/11; G03F7/20; H01L21/027
Domestic Patent References:
| WO2010123032A1 | 2010-10-28 | |||
| WO2016031563A1 | 2016-03-03 | |||
| WO2015129405A1 | 2015-09-03 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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