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Patent Searching and Data


Title:
METHOD FOR PRODUCING CONDUCTOR FILM
Document Type and Number:
WIPO Patent Application WO/2013/146389
Kind Code:
A1
Abstract:
Provided is a method by which a conductor film having a low volume resistivity is produced without thermally affecting the base even in cases where a base having a low heat resistance, such as PET and PEN, is used. A method for producing a conductor film, which comprises: a step of preparing a base; a step of forming a coating film of a conductive ink on the base, said conductive ink containing fine copper hydride particles or fine copper particles; a step of forming a fired film by heating the coating film at 100-200°C; and a step of heating the fired film at 300-500°C by irradiation of laser light.

Inventors:
KASHIWABARA SATOSHI (JP)
YONEDA TAKASHIGE (JP)
HIRAKOSO HIDEYUKI (JP)
MURAKAMI RYOTA (JP)
Application Number:
PCT/JP2013/057534
Publication Date:
October 03, 2013
Filing Date:
March 15, 2013
Export Citation:
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Assignee:
ASAHI GLASS CO LTD (JP)
International Classes:
H01B13/00; C09D5/24; C09D7/12; C09D11/00; C09D201/00; H05K3/12
Foreign References:
JP2010528428A2010-08-19
Attorney, Agent or Firm:
HAMADA Yuriko et al. (JP)
Yuriko Hamada (JP)
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