Title:
METHOD FOR PRODUCING DEPOSITION MASK, DEPOSITION MASK PREPARATION BODY, METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT, METHOD FOR PRODUCING ORGANIC EL DISPLAY, AND DEPOSITION MASK
Document Type and Number:
WIPO Patent Application WO/2017/006821
Kind Code:
A1
Abstract:
This method for producing a deposition mask comprises steps of: preparing a deposition mask preparation body having a metal mask on one surface of a resin plate for a resin mask and a protective sheet on the other surface of the resin plate, the protective sheet having a peel strength as determined in accordance with JIS Z-0237:2009 of 0.0004 N/10 mm (inclusive) to 0.2 N/10 mm (exclusive); irradiating the resin plate of the deposition mask preparation body with laser light from the metal mask side to form resin mask openings corresponding to a pattern to be formed on the resin plate by deposition; and removing the protective sheet from the resin mask with the resin mask openings corresponding to the pattern to be formed by deposition.
Inventors:
TAKEDA TOSHIHIKO (JP)
HOKARI KUMIKO (JP)
SONE YASUKO (JP)
OBATA KATSUNARI (JP)
HOKARI KUMIKO (JP)
SONE YASUKO (JP)
OBATA KATSUNARI (JP)
Application Number:
PCT/JP2016/069250
Publication Date:
January 12, 2017
Filing Date:
June 29, 2016
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD (JP)
International Classes:
C23C14/04; B23K26/382; C23C14/24; H01L51/50; H05B33/10
Foreign References:
| JP2014133938A | 2014-07-24 | |||
| JP2008036895A | 2008-02-21 | |||
| JP2013108143A | 2013-06-06 | |||
| JP2014121720A | 2014-07-03 |
Attorney, Agent or Firm:
INTECT INTERNATIONAL PATENT OFFICE et al. (JP)
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