Title:
METHOD FOR PRODUCING DIAMOND-LIKE CARBON FILM BODY.
Document Type and Number:
WIPO Patent Application WO/2011/007653
Kind Code:
A1
Abstract:
Disclosed is a method for producing a diamond-like carbon (DLC) film body with suppressed DLC film delamination. The method produces a DLC film body having a film hardness of at least 10 GPa. Before forming a DLC film, a substrate surface is pre-treated by means of discharge plasma, and a silicon carbide film intermediate layer is formed on the substrate surface. The pre-treatment of the substrate surface is performed by supplying into the chamber in which the substrate is contained a mixed gas that is a mixture of at least one volume part and no more than 10 volume parts of argon gas to every 100 volume parts of helium gas, and causing discharge plasma to be generated in the mixed gas, while adjusting the pressure within the chamber to be at least 20 hPa and no more than atmospheric temperature.
Inventors:
SAITO TAKAO (JP)
TERASAWA TATSUYA (JP)
TERASAWA TATSUYA (JP)
Application Number:
PCT/JP2010/060742
Publication Date:
January 20, 2011
Filing Date:
June 24, 2010
Export Citation:
Assignee:
NGK INSULATORS LTD (JP)
SAITO TAKAO (JP)
TERASAWA TATSUYA (JP)
SAITO TAKAO (JP)
TERASAWA TATSUYA (JP)
International Classes:
C23C16/27; C23C16/02; C23C16/42; C23C16/515
Foreign References:
| JP2007191754A | 2007-08-02 | |||
| JPH0987847A | 1997-03-31 | |||
| JP2009084591A | 2009-04-23 |
Other References:
NOBUYUKI NAKA ET AL.: "Evaluation of Adhesion Strength for Amorphous SiC Thin Film and DLC/a-SiC Laminated Thin Film Deposited on Steel Substrates for Cutting Tool", TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS A, vol. 66, no. 644, 25 April 2000 (2000-04-25), pages 698 - 705, XP008148756
YOSHIMASA KONDO ET AL.: "Synthesis of Diamond-Like Carbon Films by Nanopulse Plasma Chemical Vapor Deposition in Open Air", JPN. J. APPL. PHYS., vol. 44, 2005, pages L1573 - L1575, XP008148751
NAOTO OTAKE ET AL.: "DLC Films Preparation by Nanopulse Plasma CVD at Atmospheric Pressure", THE JOURNAL OF THE SURFACE FINISHING SOCIETY OF JAPAN, vol. 60, no. 6, 1 June 2009 (2009-06-01), pages 376 - 379, XP008148757
"Synthesis of Diamond-like Carbon Films by Nanopulse Plasma Chemical Vapor Deposition at Subatmospheric Pressure", JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOCIETY OF APPLIED PHYSICS, vol. 43, no. 1 LA, 2004, pages L1406 - L1408
KATSUJI IIDA; TAKESHI SAKUMA: "Extremely Short Pulse Generation Circuit (IES circuit) by SI Thyristor", SYMPOSIUM OF STATIC INDUCTION DEVICES, PROCEEDINGS, vol. 15, 14 June 2002 (2002-06-14), pages 40 - 45
YOSHIMASA KONDO ET AL.: "Synthesis of Diamond-Like Carbon Films by Nanopulse Plasma Chemical Vapor Deposition in Open Air", JPN. J. APPL. PHYS., vol. 44, 2005, pages L1573 - L1575, XP008148751
NAOTO OTAKE ET AL.: "DLC Films Preparation by Nanopulse Plasma CVD at Atmospheric Pressure", THE JOURNAL OF THE SURFACE FINISHING SOCIETY OF JAPAN, vol. 60, no. 6, 1 June 2009 (2009-06-01), pages 376 - 379, XP008148757
"Synthesis of Diamond-like Carbon Films by Nanopulse Plasma Chemical Vapor Deposition at Subatmospheric Pressure", JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOCIETY OF APPLIED PHYSICS, vol. 43, no. 1 LA, 2004, pages L1406 - L1408
KATSUJI IIDA; TAKESHI SAKUMA: "Extremely Short Pulse Generation Circuit (IES circuit) by SI Thyristor", SYMPOSIUM OF STATIC INDUCTION DEVICES, PROCEEDINGS, vol. 15, 14 June 2002 (2002-06-14), pages 40 - 45
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
Hidetoshi Yoshitake (JP)
Hidetoshi Yoshitake (JP)
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