METHOD FOR PRODUCING ELECTRON EMISSION ELEMENT

Title:

METHOD FOR PRODUCING ELECTRON EMISSION ELEMENT

Document Type and Number:

WIPO Patent Application WO/2011/042964

Kind Code:

A1

Abstract:

Disclosed is an electron emission element wherein a greater number of protrusions which contribute to electron emission are formed in a controlled manner, and the protrusions are easily formed over a large area in a controlled manner. A conductive film composed of a conductive material which constitutes a cathode is formed by sputtering at a total pressure of 1.0-2.8 Pa, and an etching treatment is performed for the conductive film to form a cathode having a surface provided with a plurality of protrusions.

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Inventors:

KITAO Akiko (C/O CANON KABUSHIKI KAISHA, 30-2 Shimomaruko 3-chome, Ohta-k, Tokyo 01, 〒1468501, JP)
北尾　暁子 (〒01 東京都大田区下丸子３丁目３０番２号キヤノン株式会社内 Tokyo, 〒1468501, JP)

Application Number:

JP2009/067498

Publication Date:

April 14, 2011

Filing Date:

October 07, 2009

Export Citation:

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Assignee:

CANON KABUSHIKI KAISHA (30-2, Shimomaruko 3-chome Ohta-k, Tokyo 01, 〒1468501, JP)
キヤノン株式会社 (〒01 東京都大田区下丸子３丁目３０番２号 Tokyo, 〒1468501, JP)
KITAO Akiko (C/O CANON KABUSHIKI KAISHA, 30-2 Shimomaruko 3-chome, Ohta-k, Tokyo 01, 〒1468501, JP)

International Classes:

H01J9/02; H01J1/304; H01J1/316

Attorney, Agent or Firm:

ABE, Takuma et al. (C/O CANON KABUSHIKI KAISHA, 30-2 Shimomaruko 3-chome, Ohta-k, Tokyo 01, 〒1468501, JP)

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