METHOD FOR PRODUCING FILTRATION FILTER

WIPO Patent Application WO/2014/046151

A1

Provided is a method for producing a filtration filter with which high-precision purification can be performed and the filtration efficiency can be considerably improved. A flow path-forming film (12) is formed on a substrate (11). A plurality of grooves (17) running along the surface of the substrate (11) toward the flow path-forming film (12) are formed by etching. Each of the grooves (17) is filled with a sacrificial film (18). The sacrificial film (18) is polished and the surface of the flow path-forming film (12) and the surface of the sacrificial film (18) are smoothed. A flow path-sealing film (13) is formed on the smoothed flow path-forming film (12) and sacrificial film (18). Inlet holes (14) and outlet holes (15) are formed by etching on a part of each of the substrate (11) and the flow path-sealing film (13). The sacrificial film (18) is partially exposed at the inlet holes (14) and outlet holes (15). The sacrificial film (18) is removed via the inlet holes (14) and outlet holes (15). Filtration flow paths (16) are formed in each of the grooves (17), thus producing the filtration filter (10).

MORIYA TSUYOSHI (JP)
KOBAYASHI SENSHO (JP)
KAGAWA KENICHI (JP)
SAKURABAYASHI TSUTOMU (JP)

PCT/JP2013/075213

March 27, 2014

September 11, 2013

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TOKYO ELECTRON LTD (JP)

B01D69/00; B01D69/10

WO2012063953A1	2012-05-18
WO2013146627A1	2013-10-03

JPH09511439A	1997-11-18
JP2006507105A	2006-03-02
JP2005528975A	2005-09-29
JP2004209632A	2004-07-29
JP2003305345A	2003-10-28
JPS6164303A	1986-04-02

BECCHAKU Shigehisa et al. (JP)
Role of another Shigehisa (JP)

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