Title:
METHOD FOR PRODUCING GAS BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2012/011377
Kind Code:
A1
Abstract:
Disclosed is a method for producing a gas barrier film, wherein a coating liquid containing a polysilazane is applied and a VUV treatment is carried out, and which prevents incorporation of a modification-inhibiting adsorbate into the coating film, thereby further improving the gas barrier performance. In the method for producing a gas barrier film, a coating film is formed by applying a coating liquid that contains a polysilazane over the surface of a film, and after having the resulting film pass through a drying zone, the film is irradiated with vacuum ultraviolet light from the coating film side and modified. The method for producing a gas barrier film is characterized in that an inert gas is supplied into the drying zone so that the oxygen concentration therein is 10% or less.
Inventors:
AKAGI Kiyoshi (Inc. 1, Sakura-machi, Hino-sh, Tokyo 11, 〒1918511, JP)
Application Number:
JP2011/065156
Publication Date:
January 26, 2012
Filing Date:
July 01, 2011
Export Citation:
Assignee:
Konica Minolta Holdings, Inc. (6-1 Marunouchi 1-chome, Chiyoda-ku Tokyo, 05, 〒1000005, JP)
コニカミノルタホールディングス株式会社 (〒05 東京都千代田区丸の内一丁目６番１号 Tokyo, 〒1000005, JP)
コニカミノルタホールディングス株式会社 (〒05 東京都千代田区丸の内一丁目６番１号 Tokyo, 〒1000005, JP)
International Classes:
B05D7/24; B05D3/02; B05D3/06
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Claims: