Title:
METHOD FOR PRODUCING GLASS SUBSTRATE FOR RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2012/090597
Kind Code:
A1
Abstract:
Provided is a method for producing a glass substrate that is for a recording medium, it being easy to remove colloidal silica (13) adhered to a glass substrate precursor (12) and difficult for colloidal silica (13) to re-adhere to the end surfaces of the glass substrate precursor (12). The method for producing a glass substrate for a recording medium uses a glass substrate precursor (12) and is characterized by: containing a step for polishing the front and rear surfaces of the glass substrate precursor (12) using a polishing liquid containing colloidal silica (13), and a step for cleaning the glass substrate precursor (12) by means of causing the glass substrate precursor (12) to be immersed in a cleaning liquid (10) using a cleaning carrier (11); and in said cleaning step, when the zeta potential of the colloidal silica (13) is ζSi, the zeta potential of the cleaning carrier (11) is ζcarrier, and the zeta potential of the glass substrate precursor (12) is ζsub, each of ζSi, ζcarrier, and ζsub being less than 0 mV and ζsub being no greater than ζcarrier.
Inventors:
SHIMAZU, Noriko (INC. 2970, Ishikawa-machi, Hachioji-sh, Tokyo 05, 〒1928505, JP)
Application Number:
JP2011/075965
Publication Date:
July 05, 2012
Filing Date:
November 10, 2011
Export Citation:
Assignee:
KONICA MINOLTA OPTO, INC. (2970, Ishikawa-machi Hachioji-sh, Tokyo 05, 〒1928505, JP)
コニカミノルタオプト株式会社 (〒05 東京都八王子市石川町２９７０番地 Tokyo, 〒1928505, JP)
コニカミノルタオプト株式会社 (〒05 東京都八王子市石川町２９７０番地 Tokyo, 〒1928505, JP)
International Classes:
G11B5/84; B24B1/00; B24B37/00; C03C19/00; C03C23/00
Attorney, Agent or Firm:
Fukami Patent Office, p.c. (Nakanoshima Central Tower, 2-7 Nakanoshima 2-chome, Kita-ku, Osaka-sh, Osaka 05, 〒5300005, JP)
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Claims: