Title:
METHOD FOR PRODUCING GRAPHENE MATERIAL AND GRAPHENE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2012/086233
Kind Code:
A1
Abstract:
First, a substrate body (12) is prepared, and an Ni crystalline layer (14) is formed over the entire surface of the substrate body (12). Next, the crystalline layer (14) is patterned into a zigzag shape using a lithography method, making a catalytic metal layer (16). Next, C atoms are supplied to the catalytic metal layer (16) using an acetylene/argon mixed gas. This causes the Ni surface to be rearranged into a surface (111), and the supplied C atoms to form a hexagonal lattice and graphene to grow. The graphene is formed on the catalytic metal layer (16), thus becoming the same shape as the catalytic metal layer (16), a zigzag shape. Next, square electrodes (18, 20) are attached to both ends of the zigzag-shaped graphene. Then, the catalytic metal layer (16) is dissolved in an acidic solution, and the graphene is removed as graphene material (10).
Inventors:
NARITSUKA, Shigeya (1-501 Shiogama-guchi Tenpaku-ku, Nagoy, Aichi 02, 〒4688502, JP)
成塚 重弥 (〒02 愛知県名古屋市天白区塩釜口１－５０１ 学校法人名城大学内 Aichi, 〒4688502, JP)
成塚 重弥 (〒02 愛知県名古屋市天白区塩釜口１－５０１ 学校法人名城大学内 Aichi, 〒4688502, JP)
Application Number:
JP2011/063006
Publication Date:
June 28, 2012
Filing Date:
June 07, 2011
Export Citation:
Assignee:
Meijo University (1-501 Shiogama-guchi, Tenpaku-ku Nagoy, Aichi 02, 〒4688502, JP)
学校法人 名城大学 (〒02 愛知県名古屋市天白区塩釜口１－５０１ Aichi, 〒4688502, JP)
NARITSUKA, Shigeya (1-501 Shiogama-guchi Tenpaku-ku, Nagoy, Aichi 02, 〒4688502, JP)
学校法人 名城大学 (〒02 愛知県名古屋市天白区塩釜口１－５０１ Aichi, 〒4688502, JP)
NARITSUKA, Shigeya (1-501 Shiogama-guchi Tenpaku-ku, Nagoy, Aichi 02, 〒4688502, JP)
International Classes:
C01B31/02
Attorney, Agent or Firm:
ITEC INTERNATIONAL PATENT FIRM (Pola-Nagoya Bldg, 9-26 Sakae 2-chome, Naka-ku, Nagoya-sh, Aichi 08, 〒4600008, JP)
Claims:
Previous Patent: PLANTING SUPPORT METHOD AND PLANTING SUPPORT DEVICE
Next Patent: ABRASIVE BLASTING DEVICE
Next Patent: ABRASIVE BLASTING DEVICE