Title:
METHOD FOR PRODUCING HOLLOW MICROPARTICLES USING SUPERCRITICAL LIQUID
Document Type and Number:
WIPO Patent Application WO/2023/167294
Kind Code:
A1
Abstract:
The present invention is a method for producing hollow microparticles having a resin film containing at least one resin selected from the group consisting of melamine resins, urea resins, amide resins, and urethane (urea) resins and a hollow portion surrounded by the resin film, wherein the method for producing hollow microparticles includes preparing an oil-in-water (O/W) emulsion, in which an oil phase containing an organic solvent is the dispersed phase and an aqueous phase is the continuous phase, to obtain microparticles having the organic solvent included in the interior, and removing the organic solvent from the interior of the microparticles using a supercritical liquid. The present invention can provide a method for producing hollow microparticles easily and at a good yield.
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Inventors:
SHIMIZU YASUTOMO (JP)
FUKUDA KAZUISHI (JP)
KAWASAKI TAKAYOSHI (JP)
FUKUDA KAZUISHI (JP)
KAWASAKI TAKAYOSHI (JP)
Application Number:
PCT/JP2023/007886
Publication Date:
September 07, 2023
Filing Date:
March 02, 2023
Export Citation:
Assignee:
TOKUYAMA CORP (JP)
International Classes:
C08J3/12; C08K7/22; C08L75/04
Domestic Patent References:
| WO2021201088A1 | 2021-10-07 |
Foreign References:
| CN105967168A | 2016-09-28 | |||
| JP2001504452A | 2001-04-03 | |||
| JP2008523192A | 2008-07-03 | |||
| JP2004261769A | 2004-09-24 |
Attorney, Agent or Firm:
TAGUCHI, Masahiro et al. (JP)
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