Title:
METHOD FOR PRODUCING HOLLOW RESIN PARTICLES
Document Type and Number:
WIPO Patent Application WO/2021/172402
Kind Code:
A1
Abstract:
Provided is a method for producing hollow resin particles, in which the residual quantity of a hydrocarbon-based solvent temporarily retained inside the particles in a production process is reduced, and damage is suppressed. A method for producing hollow resin particles, characterized in having: a step for preparing a mixture that contains polymerizable monomers, a hydrocarbon-based solvent, a polymerization initiator, and an aqueous medium; a step for preparing a suspension in which the mixture is suspended; a step for subjecting the suspension to polymerization to prepare a precursor composition that contains precursor particles, which have hollow sections and in which the hydrocarbon-based solvent is included in the hollow sections; and a step for removing the hydrocarbon-based solvent included in the precursor particles, the polymerizable monomers containing crosslinkable monomers in a ratio of 40-100 mass%, and the step for removing the hydrocarbon-based solvent being performed by a specific method.
Inventors:
TSUMURA RYO (JP)
Application Number:
PCT/JP2021/007008
Publication Date:
September 02, 2021
Filing Date:
February 25, 2021
Export Citation:
Assignee:
ZEON CORP (JP)
International Classes:
C08F6/24; C08F2/18; C08F265/04
Domestic Patent References:
| WO2019026899A1 | 2019-02-07 | |||
| WO2019188996A1 | 2019-10-03 | |||
| WO2018025575A1 | 2018-02-08 |
Foreign References:
| JP2020132820A | 2020-08-31 | |||
| JP2016190980A | 2016-11-10 |
Attorney, Agent or Firm:
KISHIMOTO, Tatsuhito et al. (JP)
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