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Title:
METHOD FOR PRODUCING HOLLOW SILICA PARTICLES
Document Type and Number:
WIPO Patent Application WO/2019/131658
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing hollow silica particles, each of which has a dense silica shell layer. A method for producing hollow silica particles, wherein: the pH of an oil-in-water emulsion that contains an aqueous phase, an oil phase and a surfactant is set to 3.0 or less, and a first silica starting material is added into the oil-in-water emulsion; a second silica starting material is added into the emulsion, to which the first silica starting material has been added, in the presence of alkali metal ions, while setting the pH of the emulsion to 8 or more, thereby obtaining a hollow silica precursor dispersion liquid; hollow silica precursors are obtained from the hollow silica precursor dispersion liquid; and subsequently, hollow silica particles are obtained from the hollow silica precursors.

Inventors:
KAMIYA HIROYUKI (JP)
KIM HYUNJI (JP)
MATSUBARA TOSHIYA (JP)
Application Number:
PCT/JP2018/047619
Publication Date:
July 04, 2019
Filing Date:
December 25, 2018
Export Citation:
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Assignee:
AGC INC (JP)
AGC SI TECH CO LTD (JP)
International Classes:
C01B33/18; C01B33/187
Domestic Patent References:
WO2011091285A12011-07-28
Foreign References:
JP2017088438A2017-05-25
JP2000500113A2000-01-11
JP2006102592A2006-04-20
JP2017248972A2017-12-26
Other References:
QIANYAO SUN ET AL.: "The Formation of Well-Defined Hollow Silica Spheres with Multilamellar Shell Structure", ADVANCED MATERIALS, vol. 15, no. 13, 4 July 2003 (2003-07-04)
See also references of EP 3733603A4
Attorney, Agent or Firm:
SENMYO Kenji et al. (JP)
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