Title:
METHOD FOR PRODUCING IMAGING PANEL, IMAGING PANEL, AND X-RAY IMAGING DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/021472
Kind Code:
A1
Abstract:
The purpose of the present invention is to achieve an imaging panel which is suppressed in variation in the TFT threshold characteristics by suppressing damage on a TFT during the formation of a photodiode.
This imaging panel (10) is provided, below a photodiode (15), with a metal layer (43) that is in contact with a TFT (14) via a contact hole (CH1). In a method for producing this imaging panel (10), after protecting a first insulating film (42) by forming a metal film (43p) so as to cover the first insulating film (42), semiconductor films (that form an n-type amorphous silicon layer (151), an intrinsic amorphous silicon layer (152) and a p-type amorphous silicon layer (153), respectively) are formed and a photodiode (15) is formed by patterning the semiconductor films by dry etching.
Inventors:
TOMIYASU KAZUHIDE
MIYAMOTO TADAYOSHI
MIYAMOTO TADAYOSHI
Application Number:
PCT/JP2015/071576
Publication Date:
February 11, 2016
Filing Date:
July 30, 2015
Export Citation:
Assignee:
SHARP KK (JP)
International Classes:
H01L27/146; G01T1/20; G01T7/00; H01L21/8234; H01L27/06; H01L27/144; H04N5/32; H04N5/369
Foreign References:
| JP2008244251A | 2008-10-09 | |||
| JP2009158941A | 2009-07-16 | |||
| JPS6484669A | 1989-03-29 | |||
| JP2010283167A | 2010-12-16 | |||
| JP2013089869A | 2013-05-13 | |||
| JP2011077184A | 2011-04-14 |
Attorney, Agent or Firm:
KAWAKAMI Keiko et al. (JP)
Keiko Kawakami (JP)
Keiko Kawakami (JP)
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