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Title:
METHOD FOR PRODUCING INDIUM HYDROXIDE POWDER, METHOD FOR PRODUCING INDIUM OXIDE POWDER, AND SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2014/192650
Kind Code:
A1
Abstract:
An indium hydroxide powder having uniform particle diameters and a narrow particle size distribution width is produced. A method for producing an indium hydroxide powder by electrolysis using metal indium as an anode, wherein the electrolysis is carried out under such conditions that an electrolytic solution has an electrolyte concentration of 0.1 to 2.0 mol/L, a pH value of 2.5 to 5.0 and a liquid temperature of 20 to 60ºC, the current density of an electrode is 4 to 20 A/dm2, and the concentration of an electrolytic slurry containing the deposited indium hydroxide powder falls within the range from 2 to 15%.

Inventors:
SUGAMOTO NORIAKI (JP)
KIBE TATSUO (JP)
KAMO TETSURO (JP)
IWASA TSUYOSHI (JP)
KAWAKAMI TETSUJI (JP)
TAKADA KOU (JP)
MIZUNUMA SHOUHEI (JP)
Application Number:
PCT/JP2014/063671
Publication Date:
December 04, 2014
Filing Date:
May 23, 2014
Export Citation:
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Assignee:
SUMITOMO METAL MINING CO (JP)
International Classes:
C25B1/00; C01G15/00; C04B35/00; C23C14/34; C25B11/04
Foreign References:
JP2014074224A2014-04-24
JPH1095615A1998-04-14
JPH06171937A1994-06-21
JP2013036074A2013-02-21
Attorney, Agent or Firm:
KOIKE, Akira et al. (JP)
Akira Koike (JP)
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