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Patent Searching and Data


Title:
METHOD FOR PRODUCING INFRARED RADIATION REFLECTING FILM
Document Type and Number:
WIPO Patent Application WO/2014/119683
Kind Code:
A1
Abstract:
This method for producing an infrared radiation reflecting film comprises, in order: a metal layer forming step in which a metal layer (25) is formed on a transparent film substrate (10); a metal oxide layer forming step in which a surface-side metal oxide layer (22) is formed by DC sputtering so as to be in direct contact with the metal layer (25); and a transparent protective layer forming step in which a transparent protective layer (30) is formed on the surface-side metal oxide layer (22). In the metal oxide layer forming step, a sputtering target used for DC sputtering contains zinc atoms and tin atoms, and is preferably formed by sintering at least one metal oxide among zinc oxide and tin oxide, and a metal powder. In the surface-side metal oxide forming step, an inert gas and an oxygen gas are introduced inside a sputtering film-forming chamber. The oxygen concentration in the gas introduced to the sputtering film-forming chamber is preferably not more than 8 vol%.

Inventors:
WATANABE MASAHIKO (JP)
OHMORI YUTAKA (JP)
Application Number:
PCT/JP2014/052159
Publication Date:
August 07, 2014
Filing Date:
January 30, 2014
Export Citation:
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Assignee:
NITTO DENKO CORP (JP)
International Classes:
G02B5/26; B32B9/00; B32B15/08; C23C14/06; C23C14/34
Domestic Patent References:
WO2011109306A22011-09-09
Foreign References:
JP2002533565A2002-10-08
JP2007314364A2007-12-06
JP2003502259A2003-01-21
JPH029731A1990-01-12
JPH01301537A1989-12-05
Other References:
See also references of EP 2952939A4
Attorney, Agent or Firm:
SHINTAKU, Masato et al. (JP)
Masahito Shintaku (JP)
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