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Patent Searching and Data


Title:
METHOD FOR PRODUCING A LEADFRAME ON A SUBSTRATE BY MEANS OF BLOCK COPOLYMERS
Document Type and Number:
WIPO Patent Application WO/2014/111637
Kind Code:
A3
Abstract:
The method for producing patterns from a first material comprises the following steps: - providing a substrate (1) covered by a cover layer (2), - forming a first mask by means of a self-organised block copolymer structure, the first mask comprising first patterns, - depositing and irradiating a resin (9) to form an intermediate mask on the first mask, the intermediate mask covering a portion of the first patterns formed in the first mask and comprising second holes facing the first holes, - etching the cover layer (2) through the first and second facing holes so as to form third holes (12), - filling the third holes (12) with a first material to form the patterns from a first material.

Inventors:
BELLEDENT JÉRÔME (FR)
Application Number:
PCT/FR2014/000010
Publication Date:
November 13, 2014
Filing Date:
January 17, 2014
Export Citation:
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Assignee:
COMMISSARIAT L ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR)
International Classes:
H01L21/311; H01L21/033
Foreign References:
US20110008956A12011-01-13
US20090236309A12009-09-24
US20070224819A12007-09-27
Other References:
See also references of EP 2946401A2
Attorney, Agent or Firm:
TALBOT, Alexandre et al. (10 rue d'Arménie - Europol, BP 1537 Grenoble Cedex 1, FR)
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