Title:
METHOD FOR PRODUCING LENS, RADIATION-SENSITIVE COMPOSITION FOR PRODUCING LENS, LENS, IMAGING ELEMENT, IMAGING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/140248
Kind Code:
A1
Abstract:
A lens is produced by a method comprising: a step for applying a radiation-sensitive composition onto a base material to form a coating film; a step for irradiating a portion of the coating film with a radioactive ray to generate an acid in an exposed portion; a step for developing the coating film that has been irradiated with the radioactive ray to form a pattern; a step for irradiating the pattern with a radioactive ray; and a step for heating the pattern after the irradiation of the pattern with the radioactive ray to form a lens. The radiation-sensitive composition comprises at least one polymer (A), a radiation-sensitive acid generator (B) and a solvent(C), in which the polymer (A) contains, in a single molecule or different molecules, a structural unit (a1) having a hydroxyl group bound to an aromatic ring and a structural unit (a2) having such a configuration that an acid-dissociating group is detached by the action of an acid to generate a carboxyl group.
Inventors:
MATSUMURA NOBUJI (JP)
WADA MITSUHIRO (JP)
HAMAGUCHI HITOSHI (JP)
WADA MITSUHIRO (JP)
HAMAGUCHI HITOSHI (JP)
Application Number:
PCT/JP2023/001175
Publication Date:
July 27, 2023
Filing Date:
January 17, 2023
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/20; G03F7/039; G03F7/40
Foreign References:
| KR20100073594A | 2010-07-01 | |||
| JP2016133733A | 2016-07-25 |
Attorney, Agent or Firm:
YAMADA, Tsuyoshi (JP)
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