Title:
METHOD FOR PRODUCING LOW Α-EMITTING BISMUTH AND LOW Α-EMITTING BISMUTH
Document Type and Number:
WIPO Patent Application WO/2015/125331
Kind Code:
A1
Abstract:
Provided is a low α-emitting bismuth, characterized in that the α ray emission rate is 0.003 cph/cm2 or less. Provided is a method for producing a low α-emitting bismuth, characterized in that bismuth having an α ray emission rate of 0.5 cph/cm2 or less is used as the starting material; the starting bismuth is dissolved in a nitric acid solution by electrolysis to produce a bismuth nitrate solution having a bismuth concentration of 5 to 50 g/L and pH of 0.0 to 0.4; the solution is passed through a column packed with an ion-exchange resin and the polonium in the solution is removed by exchange with the ion-exchange resin; and the liquid after being passed through the ion-exchange resin is subjected to electrowinning and the bismuth is recovered.
Inventors:
HOSOKAWA YU (JP)
Application Number:
PCT/JP2014/075025
Publication Date:
August 27, 2015
Filing Date:
September 22, 2014
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C25C1/22; C22B3/42; C22B30/06; C22C12/00; C22C13/02; H01L21/60; B23K1/00
Domestic Patent References:
| WO2014069357A1 | 2014-05-08 |
Foreign References:
| JP2013185214A | 2013-09-19 | |||
| JPH10158754A | 1998-06-16 | |||
| RU2436856C1 | 2011-12-20 |
Attorney, Agent or Firm:
OGOSHI Isamu et al. (JP)
Isamu Ogoshi (JP)
Isamu Ogoshi (JP)
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