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Title:
METHOD FOR PRODUCING MAGNETIC DISK SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2018/003878
Kind Code:
A1
Abstract:
Provided is a method for producing a magnetic disk substrate, which is capable of reducing scratches in the substrate surface after polishing, while maintaining a high polishing rate. The present disclosure relates to a method for producing a magnetic disk substrate, which comprises a polishing step for polishing a substrate to be polished with use of a polishing liquid composition containing abrasive grains and water, and wherein the abrasive grains are particles each having a cutting depth of from 5 nm to 25 nm (inclusive), said cutting depth being the depth of a recess that is formed when each abrasive grain cuts the substrate surface.

Inventors:
KIMURA YOSUKE
OI SHIN
Application Number:
PCT/JP2017/023804
Publication Date:
January 04, 2018
Filing Date:
June 28, 2017
Export Citation:
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Assignee:
KAO CORP (JP)
International Classes:
G11B5/84
Foreign References:
JP2002167240A2002-06-11
JP2009245467A2009-10-22
JP2016027517A2016-02-18
Attorney, Agent or Firm:
IKEUCHI SATO & PARTNER PATENT ATTORNEYS (JP)
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