Title:
METHOD FOR PRODUCING MASK FILM
Document Type and Number:
WIPO Patent Application WO/2014/097728
Kind Code:
A1
Abstract:
The present invention is a method for producing a mask film, in which an opening pattern (1), which penetrates through a resin film (2) at a predetermined position on the resin film (2), is formed by a laser processing procedure. In the method, a meniscus of a liquid film (14) is formed between the film (2) and a smooth surface (13b) of a reference substrate (13) that supports the film (2), then the film (2) and the reference substrate (13) are closely adhered to each other by the action of an adsorption force that is generated by the action of a Laplace pressure, and then the opening pattern (1) is formed by a laser processing procedure. In this manner, the speed of the laser processing procedure can be increased without raising burrs at an edge part of the opening pattern.
Inventors:
KUDO SYUJI (JP)
YANAGAWA YOSHIKATSU (JP)
GOTO TAKAYUKI (JP)
YANAGAWA YOSHIKATSU (JP)
GOTO TAKAYUKI (JP)
Application Number:
PCT/JP2013/078162
Publication Date:
June 26, 2014
Filing Date:
October 17, 2013
Export Citation:
Assignee:
V TECHNOLOGY CO LTD (JP)
International Classes:
C23C14/04; B23K26/00; B23K26/36; H01L51/50; H05B33/10
Foreign References:
| JP2004190057A | 2004-07-08 | |||
| JP2008121060A | 2008-05-29 | |||
| JPH07300664A | 1995-11-14 | |||
| JP2012077328A | 2012-04-19 | |||
| JP2013095992A | 2013-05-20 | |||
| JP2013108143A | 2013-06-06 | |||
| JP2013165058A | 2013-08-22 |
Attorney, Agent or Firm:
SASAJIMA, Fujio et al. (JP)
Sasajima Wealth 2 male (JP)
Sasajima Wealth 2 male (JP)
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