METHOD FOR PRODUCING A MIRROR HAVING AT LEAST TWO MIRROR SURFACES, MIRROR OF A PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY, AND PROJECTION EXPOSURE APPARATUS

WIPO Patent Application WO/2011/020690

A3

The invention relates to a mirror (M) of a projection exposure apparatus for rnicrolithography for the structured exposure of a light-sensitive material and to a method for producing a mirror (M), The mirror (M) according to the Invention has a substrate body (B), a first mirror surface (S) and a second mirror surface (S5). The first mirror surface (S) is formed on a first side (VS) of the substrate body (3). The second mirror surface (S') is formed on a second side (RS) of the substrate body (B), said second side being different from the first side of the substrate body (B). The mirror (M) according to the invention can be embodied, in particular, such that the substrate body (B) is produced from a glass ceramic material.

JP3201394	fθ LENS
WO/2002/025345	LENS FOCUSING DEVICE, SYSTEM AND METHOD FOR USE WITH MULTIPLE LIGHT WAVELENGTHS
JPWO2003001271	An optical system and an exposure device equipped with the optical system

HETZLER JOCHEN (DE)
MUELLER RALF (DE)
SINGER WOLFGANG (DE)

PCT/EP2010/061148

July 28, 2011

July 30, 2010

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ZEISS CARL SMT GMBH (DE)
HETZLER JOCHEN (DE)
MUELLER RALF (DE)
SINGER WOLFGANG (DE)

G02B13/14; G02B17/06; G03F7/20

WO2003016977A2

2003-02-27

DE102005042005A1	2006-07-06
DE102004008824A1	2005-09-08
US20050254120A1	2005-11-17

CARL ZEISS AG (Oberkochen, DE)

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