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Patent Searching and Data


Title:
METHOD FOR PRODUCING MIXED GAS AND GAS MIXING DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/084716
Kind Code:
A1
Abstract:
This gas mixing device (1) is provided with a main gas flow path (10), an added gas flow path (20), a mixing section (32), and a flow rate control unit (40). The following are provided on the main gas flow path (10): a pilot-operated pressure adjustment unit (14) for adjusting the pressure of a main gas (G1) on the basis of the pressure inside the added gas flow path (20); and a mass flow meter (15) for detecting the flow rate of the main gas flow path (10). An added gas flow rate adjuster (24) for adjusting the flow rate of an added gas (G2) is provided to the added gas flow path (20). The flow rate control unit (40) uses the added gas flow rate adjuster (24) to control the flow rate of the added gas (G2) on the basis of the flow rate of the main gas (G1) detected by the mass flow meter (15).

Inventors:
TAKAMISAWA KAZUHIKO (JP)
MIYOSHI TAKASHI (JP)
Application Number:
PCT/JP2012/080088
Publication Date:
June 13, 2013
Filing Date:
November 20, 2012
Export Citation:
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Assignee:
NISSAN TANAKA CORP (JP)
International Classes:
B01F23/10
Foreign References:
JPH11248100A1999-09-14
JPS6167748U1986-05-09
JPS61167435A1986-07-29
JPS6316050U1988-02-02
JPS5912744A1984-01-23
JPH09155180A1997-06-17
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
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Claims: