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Title:
METHOD FOR PRODUCING MULTILAYER BODY, AND MULTILAYER BODY
Document Type and Number:
WIPO Patent Application WO/2023/276638
Kind Code:
A1
Abstract:
A method for producing a multilayer body that comprises two silicon substrates, the method comprising a novel process for bonding the two silicon substrates. A method for producing a multilayer body that comprises two silicon substrates, the method comprising: (a) a step for preparing a first silicon substrate that has a first bonding part and a second silicon substrate that has a second bonding part, the first bonding part and the second bonding part being portions that contain a silicon oxide; and (b) a step for bonding the first bonding part and the second bonding part to each other by means of a reaction product derived from an organic material that is reactive with a hydrosilyl group and/or a silanol group.

Inventors:
NAMIKAWA TAKASHI (JP)
NAKAGAWA CHIHIRO (JP)
MATSUNAGA TAKAYUKI (JP)
Application Number:
PCT/JP2022/023647
Publication Date:
January 05, 2023
Filing Date:
June 13, 2022
Export Citation:
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Assignee:
DAIKIN IND LTD (JP)
International Classes:
H01L21/02; B32B7/12; B32B9/00; B32B37/12; B32B37/14; C09J11/06; C09J183/04; C09J201/00
Domestic Patent References:
WO2020100965A12020-05-22
WO2015072418A12015-05-21
WO2016204114A12016-12-22
Foreign References:
JPH0246722A1990-02-16
JP2005347302A2005-12-15
JP2020036039A2020-03-05
JP2013082834A2013-05-09
JP2012069783A2012-04-05
JP2007184546A2007-07-19
JP2021108617A2021-08-02
JP2021168166A2021-10-21
Attorney, Agent or Firm:
YAMAO, Norihito et al. (JP)
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