METHOD FOR PRODUCING MULTILAYER METASURFACE STRUCTURE, AND MULTILAYER METASURFACE STRUCTURE

WIPO Patent Application WO/2024/070650

A1

The present invention addresses the problem of providing a production method that makes it possible to produce a multilayer metasurface structure with excellent position precision between metasurface structures. A production method according to the present invention comprises: a step 1 for disposing a spacer part including a polymerizable compound in a pattern on a first metasurface structure which includes a first substrate and a first structure layer that is provided to at least one surface side of the first substrate and that is obtained by disposing a plurality of first metallic microstructures in the in-plane direction; a step 2 for affixing, to the spacer part, a second metasurface structure which includes a second substrate and a second structure layer that is provided to at least one surface side of the second substrate and that is obtained by disposing a plurality of second metallic microstructures in the in-plane direction, so as to obtain a laminate including the first metasurface structure, the spacer part, and the second metasurface structure; and a step 3 for polymerizing the polymerizable compound.

JPH03145201	MICROWAVE WINDOW
JP6123025	A manufacturing method of a built type antenna

KANNA SHINICHI (JP)
YOSHIHIRO TATSUYA (JP)
MOROZUMI KAZUMASA (JP)

PCT/JP2023/033137

April 04, 2024

September 12, 2023

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FUJIFILM CORP (JP)

H01P11/00; G02B3/00; G02B5/00; G02B5/18; H01P1/00; H01Q15/10; H05K1/03

ITOH Hideaki et al. (JP)

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