Title:
METHOD FOR PRODUCING NANOPARTICLES BY FORCED ULTRA-THIN FILM ROTARY PROCESSING
Document Type and Number:
WIPO Patent Application WO/2009/008393
Kind Code:
A1
Abstract:
A method for producing nanoparticles is characterized in that two processing
surfaces capable of approaching each other and separating from each other and
rotating relative to each other are held with a small gap of 1 mm or less, that the
space between the surfaces is used as a passage for a fluid under processing, and
that a forced thin film of the fluid is formed and nanoparticles are precipitated
in the forced thin film.
Inventors:
ENOMURA, Masakazu (2-16, Technostage 2-chom, Izumi-Shi Osaka 44, 5941144, JP)
Application Number:
JP2008/062236
Publication Date:
January 15, 2009
Filing Date:
July 04, 2008
Export Citation:
Assignee:
M.Technique Co., Ltd. (2-16, Technostage 2-chome Izumi-Shi Osaka, 44, 5941144, JP)
エム・テクニック株式会社 (〒44 大阪府和泉市テクノステージ二丁目２番１６号 Osaka, 5941144, JP)
エム・テクニック株式会社 (〒44 大阪府和泉市テクノステージ二丁目２番１６号 Osaka, 5941144, JP)
International Classes:
B02C7/14; B01J19/00; B41J2/01; B41M5/00; C09B67/02; C09B67/10; C09B67/20
Attorney, Agent or Firm:
SAMEJIMA, Takenobu (Shinmachi Bldg. 905, 2-13 Shinmachi 1-chome,Nishi-k, Osaka-shi Osaka 13, 5500013, JP)