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Patent Searching and Data


Title:
METHOD FOR PRODUCING OPTICAL ELEMENT, AND OPTICAL ELEMENT
Document Type and Number:
WIPO Patent Application WO/2020/022504
Kind Code:
A1
Abstract:
The present invention provides: a method for producing an optical element, which is capable of forming an optically anisotropic layer that is suppressed in in-plane unevenness; and an optical element. A method for producing an optical element that comprises an optically anisotropic layer which is formed with use of a liquid crystal composition containing a liquid crystal compound, an alignment film which aligns the liquid crystal compound, and a supporting body. This method for producing an optical element comprises: an alignment film formation step wherein an alignment film is formed on one surface of a supporting body; and an optically anisotropic layer formation step wherein an optically anisotropic layer is formed on the alignment film. The alignment film contains a photo-alignment material; and the alignment film formation step comprises a light exposure step wherein different in-plane positions of the alignment film are exposed to light having different polarization directions. The supporting body has a light absorption band which overlaps with the light absorption band where a photochemical reaction of the alignment film occurs by means of irradiation of light that is polarized during the light exposure step.

Inventors:
SATO HIROSHI (JP)
SAITOH YUKITO (JP)
Application Number:
JP2019/029516
Publication Date:
January 30, 2020
Filing Date:
July 26, 2019
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/30; G02B5/18; G02B5/22
Domestic Patent References:
WO2015005122A12015-01-15
Foreign References:
JP2008532085A2008-08-14
JP2011039510A2011-02-24
JP2013142727A2013-07-22
JP2010525395A2010-07-22
JP2015532468A2015-11-09
Attorney, Agent or Firm:
ITOH Hideaki et al. (XYMAX Iwamoto-cho Building 6F, 3-3 Iwamoto-cho 2-chome, Chiyoda-k, Tokyo 32, 〒1010032, JP)
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