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Patent Searching and Data


Title:
METHOD FOR PRODUCING OPTICAL FILM
Document Type and Number:
WIPO Patent Application WO/2017/213001
Kind Code:
A1
Abstract:
By simultaneously conducting electricity to a plurality of sputtering chambers during preliminary film formation when producing an optical film for forming a multilayer optical thin-film on a film substrate, the present invention forms a layered thin-film body of two or more different material types on a film substrate, and calculates the film thickness of the plurality of thin-films on the basis of the optical properties obtained by an optical measurement unit (80) provided in the sputtering device. The film thickness measurement and thin-film formation conditions are repeatedly adjusted until the optical properties obtained by the optical measurement unit or the film thickness of the plurality of thin-films calculated on the basis of the optical properties falls within a prescribed range.

Inventors:
SHUTO SHUNSUKE (JP)
SAKI SATORU (JP)
Application Number:
PCT/JP2017/020314
Publication Date:
December 14, 2017
Filing Date:
May 31, 2017
Export Citation:
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Assignee:
NITTO DENKO CORP (JP)
International Classes:
C23C14/54; C23C14/56; G02B1/115
Foreign References:
JP2008007790A2008-01-17
JP2007182601A2007-07-19
JP2006336029A2006-12-14
JP2000178717A2000-06-27
JP2010182769A2010-08-19
JP2006083404A2006-03-30
Attorney, Agent or Firm:
SHINTAKU, Masato et al. (JP)
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