Title:
METHOD FOR PRODUCING ORGANIC THIN FILM BY USING FILM PHYSICAL PROPERTY IMPROVING PROCESS
Document Type and Number:
WIPO Patent Application WO/2008/016029
Kind Code:
A1
Abstract:
Disclosed is a method for producing an organic thin film which is excellent in
film physical properties such as heat resistance and durability. Specifically
disclosed is a method for producing an organic thin film wherein an organic thin
film is formed on a base surface, which method comprises at least a step (B) wherein
a base is brought into contact with an organic solvent solution containing a metal
surface active agent having at least one hydrolyzable group or hydroxy group,
and a catalyst interactive with the metal surface active agent. This method
for producing an organic thin film is characterized by further comprising, after
the step (B), a step (E1) for heating the base, which has been brought into contact
with the organic solvent solution, at a temperature within the range of 100-150˚C,
a step (E2) for immersing the base, which has been brought into contact with the
organic solvent solution, into a hot water having a temperature of not less than
40˚C but less than the boiling point, or a step (E3) for bringing the base,
which has been brought into contact with the organic solvent solution, into contact
with a water vapor within the temperature range of 60-150˚C.
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Application Number:
JP2007/064939
Publication Date:
February 07, 2008
Filing Date:
July 31, 2007
Export Citation:
Assignee:
NIPPON SODA Co., LTD. (2-1 Ohtemachi 2-chome, Chiyoda-ku Tokyo, 65, 1008165, JP)
日本曹達株式会社 (〒65 東京都千代田区大手町二丁目２番１号 Tokyo, 1008165, JP)
日本曹達株式会社 (〒65 東京都千代田区大手町二丁目２番１号 Tokyo, 1008165, JP)
International Classes:
B05D7/24; B01J19/00; B05D3/02; B05D3/10
Attorney, Agent or Firm:
HIROTA, Masanori et al. (3F Wakabayashi Building, 8-5 Akasaka 2-chome,Minato-k, Tokyo 52, 1070052, JP)
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