Title:
METHOD FOR PRODUCING PATTERN FORMED BODY
Document Type and Number:
WIPO Patent Application WO/2016/047650
Kind Code:
A1
Abstract:
Provided is a method for producing a pattern formed body which is suppressed in pattern defects.
A method for producing a pattern formed body according to the present invention comprises: a step wherein a pattern formation layer is formed by applying a photocurable composition onto a substrate or onto a mold having a pattern, the pattern formation layer is cured by irradiating the pattern formation layer with light after sandwiching the pattern formation layer by the substrate and the mold, and a pattern is formed by removing the mold from the surface of the cured pattern formation layer; and a step wherein a heating treatment is carried out after removing or thinning a film in a recessed portion of the thus-obtained pattern, said film being derived from the photocurable composition.
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Inventors:
GOTO YUICHIRO (JP)
Application Number:
PCT/JP2015/076843
Publication Date:
March 31, 2016
Filing Date:
September 24, 2015
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
H01L21/027; B29C59/02; C08F2/48
Foreign References:
| JP2010037541A | 2010-02-18 | |||
| JP2010186979A | 2010-08-26 | |||
| JP2011066273A | 2011-03-31 | |||
| JP2010245130A | 2010-10-28 | |||
| JP2004004515A | 2004-01-08 | |||
| JP2010229220A | 2010-10-14 |
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
Patent business corporation patent firm Sykes (JP)
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