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Title:
METHOD FOR PRODUCING PATTERN
Document Type and Number:
WIPO Patent Application WO/2017/073104
Kind Code:
A1
Abstract:
Provided is a method that is for producing a pattern and that has improved reliability. The method for producing a pattern includes a thin-film formation step for forming a thin film on a support substrate 3 having flexibility using a mask M that is provided on the support substrate 3 and that is releasable from the support substrate 3, a release step for releasing the mask M from the support substrate 3, and a removal step for removing dust generated when the mask M is released.

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Inventors:
SHAKUTSUI MASATO (JP)
SHIMOGAWARA MASAYA (JP)
KISHIKAWA EIJI (JP)
MORISHIMA SHINICHI (JP)
Application Number:
PCT/JP2016/066391
Publication Date:
May 04, 2017
Filing Date:
June 02, 2016
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO (JP)
International Classes:
C23C14/04; H01L51/50; H05B33/02; H05B33/10; H05K3/14
Foreign References:
JP2006263685A2006-10-05
JP2002235166A2002-08-23
JP2014216191A2014-11-17
JP2010242116A2010-10-28
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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