Title:
METHOD FOR PRODUCING POLISHED ARTICLE
Document Type and Number:
WIPO Patent Application WO/2015/050218
Kind Code:
A1
Abstract:
A grinding device (10) is provided with: a controller (11) that controls the entire device; a grinding motor (14); a base (15) that is rotated by the grinding motor (14); and a grinding stone (16) affixed to the base (15). In a grinding step, the grinding device (10) is used to grind the surface (19) of an article (18) to be polished by means of the grinding stone (16) rotated at a circumferential speed of no greater than 10 m/s. In the grinding step, the surface (19) of the article (18) to be polished is preferably ground by means of the grinding stone (16) rotated at a circumferential speed of at least 0.5 m/s. In the grinding step, the surfaces of alumina, sapphire, silicon carbide, and gallium nitride are ground as the articles to be polished. Also, a lapping step for polishing the post-grinding article to be polished by means of abrasive grit is preferably included.
Inventors:
KITAMURA KAZUMASA (JP)
NAGAE TOMOKI (JP)
NAGAE TOMOKI (JP)
Application Number:
PCT/JP2014/076433
Publication Date:
April 09, 2015
Filing Date:
October 02, 2014
Export Citation:
Assignee:
NGK INSULATORS LTD (JP)
International Classes:
B24B1/00; H01L21/304
Domestic Patent References:
| WO2013038573A1 | 2013-03-21 |
Foreign References:
| JPS63200953A | 1988-08-19 | |||
| US6206764B1 | 2001-03-27 | |||
| JP2012223838A | 2012-11-15 | |||
| JPH06170703A | 1994-06-21 | |||
| JP2005271160A | 2005-10-06 |
Attorney, Agent or Firm:
ITEC INTERNATIONAL PATENT FIRM (JP)
Patent business corporation Itec international patent firm (JP)
Patent business corporation Itec international patent firm (JP)
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