METHOD FOR PRODUCING POLYMER COMPOUND, POLYMER COMPOUND, AND PHOTORESIST RESIN COMPOSITION

Title:

METHOD FOR PRODUCING POLYMER COMPOUND, POLYMER COMPOUND, AND PHOTORESIST RESIN COMPOSITION

Document Type and Number:

WIPO Patent Application WO/2014/024702

Kind Code:

A1

Abstract:

Provided are a method for producing a polymer compound that has a very low content of impurities such as metal components and has excellent preservation stability, a polymer compound obtained by this production method, and a photoresist resin composition containing the polymer compound. This method for producing a polymer compound comprises a step for using a filter that contains no strongly acidic cation exchange groups and exhibits a positive zeta potential to filter a resin solution containing a polymer compound having at least one species of monomer unit (a) selected from monomer units represented by formulae (a1) to (a3), and a monomer unit (b) comprising a group that is partially eliminated by acid to become alkali-soluble.

Inventors:

EGUCHI AKIRA (JP)
NISHIMURA MASAMICHI (JP)

Application Number:

PCT/JP2013/070289

Publication Date:

February 13, 2014

Filing Date:

July 26, 2013

Export Citation:

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Assignee:

DAICEL CORP (JP)

International Classes:

C08F6/06; C08F220/10; G03F7/039

Foreign References:

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